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Barium Titanate sputtering target(BaTiO3)

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China Rare Metal Material Co., Limited
Contact: Minna Shu (Ms.)
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Address:Unit 1208-1212,HongGu JingDian Building, No.1378 HongGu Aven

Details

arium Titanate Sputtering target - BaTiO3 target
Purity --- 99.8%,99.95%

Shape --- Disk, Plate, Plate, Sheet, Rod, Taper

Application - Media, TFR, Thin film capacitor

Barium Titanate Evaporation Material - BaTiO3
Purity --- 99.8%,99.95%

Melting point---1612 ℃

Theoretical density --- 6.06g/cm3

Shape --- 1-5mm,Ø10mm, piece

Application - Media, TFR, Thin film capacitor

Barium Titanate Powder - BaTiO3
Purity --- 99.8%,99.95%

Shape --- Powder

Barium Titanate sputtering target(BaTiO3)

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