High purity sputtering Cr target

Specifications

1.Purity:>=99.95%
2.Density:7.2g/cm3
3 Surface: Bright, Polish
4 MOQ: 10 pcs
5 Dimensions: as customers' request

Our Advantage

1. Competitive price.
2. Our strengths over other suppliers.
3. Reliable quality on the base of the same price.
4. Timely delivery as your requirements.
5. Professional service to cut much purchasing costs down.
Widely used in coating processing industries
A: Solar Photovoltaic Appication.
B: Electronic and Semiconductor Appication.
C: Decoration and Coating Appication. etc.

Widely used in coating processing industries
A: Solar Photovoltaic Appication.
B: Electronic and Semiconductor Appication.
C: Decoration and Coating Appication. etc.
High purity sputtering Cr target