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Vacuum Furnace for Electric and Electronic Elements

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There two types in furnace structure: vertical and horizontal type.
There three types of push-pull vessel: ramping, dual-shaft and cantilever type.
The workstation models are of simple (with or without purification) and standard (with or without purification) workstations.
The combination and connection method of the equipments can be distinguished by the following aspects
1. By flow controller: They are of types of float flow meter or mass flow controller.:
2. By valve & connection method: They can be classified by three connection method as imported solenoid valve union socket, importedpneumatic valve union socket and imported pneumatic valve VCR connection.
By processing method: They can be classified in many processing ways such as dry oxidization, wet oxidization (conventional wet oxidization and H2 - O2 synthesis oxidization), phosphorus diffusion, boron diffusion and annealing (alloy) etc.

 

Key technical data of vacuum diffusion system

 Working temperature range: (400—1285) °C;
 Long-term working temperature: (1000—1285) °C;
 Length & precision of constant temp. Zone:
 (900—1285)°C; 760mm/±0.5°C  (400—900)°C; 760mm/±1.0°C
 Single point temperature stability: (900—1285)°C; 
 760mm/±0.5°C/48h (400—900)°C; 760mm/±1.0°C/48h
 Slop of Temperature increase/decrease control curve:
 Max. speed of temp. decrease:15°C/min
 Max. speed of temp. Decrease:5°C/min;(1285~900°C)
 It is with programmable automatic correction function on temperature of constan  t temperature zone to automatically measure temperature distribution in the zone.

 Gas: TBD
 Vacuum stainless steel flange, furnace door and vacuum pipeline
 Temperature at furnace door : <80°C with heat radiant resistant measures
 Vacuum pipeline: hard connection, inner wall electrochemical polishing, air-hole fre  e, solid fixation.
 Oil-free vacuum engine unit:
 Turbo-molecular pump: 
 Dry pump (water cooling): Vacuum limit less than 0.9 Pa
 System working vacuum: Less than 2.0×10-4Pa
 System vacuum-pumping capability: Time to reach 2.0×10-4Pa by pumping vacuum chamber ≤40 min

 



Vacuum Furnace for Electric and Electronic Elements
 
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